IVS-IPSTA 2020 - ONLINE on December 13, 2020

The IVS-IPSTA-2020 Call for Abstracts is now open

Categories for abstract submission for Poster presentation and Oral talk:

  1. Plasma Science – morning and afternoon sessions: session chairs: Ido Barth (HUJI), Yoav Hadas (Rafael).
  2. Microscopy and Spectroscopy of Surfaces and Interfaces - session chair: Maya Bar-Sadan (BGU).
  3. Energy and Catalysis- session chair: Malachi Noked (BIU).
  4. Nanomaterials, Thin films and Surface Science – session chair: David Zitoun (BIU).
  5. Nanoelectronics and Spintronics – session chair: Elad Koren (Technion).
  6. Soft and Biological Matter – session chair: Ulyana Shimanovich (WIS).
  7. Sensors and Printing – session chair: Amit Sitt (TAU).

Submission Deadline: November 13, 2020


Submission procedure:

  • Abstracts must be sent by email to with the subject line "IVS-IPVSTA 2020 - Poster [or Talk] for the category [category name]".
  • In the body of the email, state your full name including title, affiliation, category, details for contact (email and cell phone), and the title of your poster/talk.
  • The abstracts should be sent as an attachment (PDF format). The file name should include the name of the participant and category (abbreviate if long). In the attached file, the title of the poster/talk, the name of the participant, and their affiliation must be clearly mentioned above the abstract.

A confirmation email will be sent upon the submission of the abstract. All abstracts will undergo review by the IVS scientific committee. Submitting authors will be notified via email regarding the status of their abstract acceptance. 

Organizing Committee

The IVS-IPSTA 2020 conference is being organized by Gilbert Daniel Nessim, IVS President (BIU), Hagay Shpaisman (BIU), Ilya Grinberg (BIU), Yaron Amouyal (Technion), Noa Lachman-Senesh (TAU), Haim Barak (BIU), and Sharon Waichman (NRCN,Rotem Industries) and will encompass various aspects of surface science, nanoscience and nanotechnology, material science and plasma science and technology.